Potassium fluoride,anhydrous
           Potassium fluoride,extra pure
           Potassium fluoride,Granular
           Silicon Dioxide
           Hydrofluoric acid
           Synthetic Cryolite
           Potassium Fluoaluminate
           Ammonium bifluoride
           Potassium Bifluoride
           Aluminium fluoride
           Sodium fluoride
           Potassium Fluorosilicate
           Fluorosilicic Acid
           Sodium silicofluoride
           Potassium Hydroxide Flakes
           Magnesium Fluoride
           Magnesium fluorosilicate
           Barium Fluoride
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The basic idea behind these two experimental ways was to check if the preliminary hydrofluoric acid-based treatment and HF presence during the subsequent chemical modification of the Si NCs with alkyl groups will really improve electronic quality of the NC surface. In particular, HF acid was expected not only to remove defect states created by oxygen atoms on the NC surface but also to etch out completely the whole damaged near-surface region of the hydrogenated NCs with numerous structural defects appeared during the NC formation by anodization of bulk Si. Only a few attempts aiming introduction of HF acid in the hydrosilylation of Si NCs have been already declared in literature.

Some studies have reported an increase of the hydrosilylation reaction efficiency due to addition of the hydrofluoric acid into styrene solution containing Si nanoparticles. In order to check an impact of the preliminary Hydrofluoric acid-based treatment of Si NCs under UV light, concentration of free charge carriers in meso-PS free layers constituted by interconnected Si NCs has been monitored by infrared (IR) absorption spectroscopy. Finally, our approach allows to completely avoid development of painstaking procedures and set-ups preventing oxidation induced deterioration of physical properties of the individual and interconnected Si NCs during chemical stabilization/passivation of their surface.

Hydrofluoric acid, the main application: Due to the ability of dissolving and oxidizing of Hydrofluoric acid, it plays an important role in the purification of aluminum and uranium. Hydrofluoric acid is also used to etch glass, cleaning residue on the sand casting, controlled fermentation, power semiconductor wafer polishing and cleaning corrosion. The catalyst in the refinery it may be used as an alkylation reaction of isobutane and butane, excluding stainless steel surface oxygen impurity "pickling" process will be used hydrofluoric acid. Hydrofluoric acid is also used for the synthesis of various fluorine-containing organic compounds, such as Teflon (polytetrafluoroethylene), a flon type refrigerant.  For the nuclear industry, the system of the element fluorine, fluoride, can also be used as a catalyst, fluoride, and the like for the manufacture of an organic or inorganic fluoride, but also for stainless steel, non-ferrous metal pickling, and pickling frosted glass, frosted lamp treatment.